EDA Tech Forum 2007 -Wantage
8:45 - 9:45 Registration / Breakfast / Vendor Fair
9:45 - 10:45 Keynote - Changing the Design Rules
10:45 - 11:35 Technical Sessions (Choose below)
11:35 - 1:00 Lunch
1:00 - 2:00 The Semiconductor Industry, the fuel of our Planet
2:00 - 2:50 Technical Sessions (Choose below)
2:50 - 3:20 Break
3:20 - 5:00 Technical Sessions (Choose below)
5:00 - 6:00 Reception Drinks/Prize Giveaway
Choose Your Sessions
Create your schedule by selecting the sessions you would like to attend.
Chip Symposium - Functional Verification
10:45 - 11:35 Achieving Optimal Designs Through Electronic System Level (ESL) Methodologies [ Show abstract ]
Today’s advanced designs have grown too massive and complex to cost-effectively design and verify using traditional RTL methodologies alone. This trend toward increasing complexity has led to more ASIC re-spins, lost revenue from missed design deadlines, and sub-optimal systems that are larger, slower or consume more power than required. Electronic System Level (ESL) design methodologies address this complexity problem by elevating design to a higher level of abstraction. This relieves hardware designers from the design errors caused by the overwhelming detail of lower-level methodologies. Even more important, the single source methodology eliminates the most common source of errors between the system designer and the hardware designer. In this session, attendees will learn how to use SystemC transaction-level modeling (TLM) to quickly perform architectural tradeoffs for power, performance and area, and evaluate hardware/software interactions. Attendees will also learn how best-in-class high-level synthesis technology can support TLM-based processes, and automate the creation of optimized RTL implementations while allowing designers to easily target interface protocols for buses or memory components – all without changing the source code. Using this methodology, designers can create, optimize and verify designs that are tailored to their design specifications 10-100X more productive than traditional methodologies.
2:00 - 2:50 Product Development Flow Including Model-Based Design and System-Level Functional Verification. Presented by The MathWorks. [ Show abstract ]
Using real-world signal processing application examples, this presentation will illustrate how Model-Based Design accelerates the design and implementation of complex algorithms in FPGAs and ASICs. MathWorks engineers will discuss the complete development flow including floating-point algorithm development, refinement to include finite wordlength effects; executable specification and system simulation; automatic generation of synthesizable HDL and system-level testbenches; integration of optimized HDL; and system-level functional verification using Simulink product family with HDL simulators such as Mentor’s ModelSim.
3:20 - 4:10 Practical Applications of Mentor's Advanced Verification Methodology (AVM) [ Show abstract ]
While many engineers understand the concepts of new verification techniques, they may be unsure of how best to apply them to their particular project. Mentor Graphics Advanced Verification Methodology (AVM) was developed explicitly to help verification teams get past this "blank page" phase of the project by providing a library of modular, reusable transaction-level verification components to efficiently create transaction-level testbenches for today’s advanced technologies: constrained-random stimulus, functional coverage, and assertions. This session provides an overview of transaction-level modeling (TLM) and the AVM for planning and analysis, including how to develop testbenches for real-world applications. A demonstration encapsulating the testbench for reusability and customization is also included in this presentation.
4:10 - 5:00 Blended Coverage – A Recipe for Success [ Show abstract ]
Verification, like an exotic blender concoction, is a multi-dimensional undertaking that generally spans multiple levels of abstractions, evolves throughout a project’s lifecycle, and depends on multiple tools and processes. Success requires coverage metrics to determine the quality and completeness of the verification process, and serve two primary purposes: 1) Identify where we have been (that is, what functionality or implementation structures have been verified), and 2) Identify how far we have to go (that is, where the verification process currently stands in terms of completion). Yet measuring and analyzing coverage, like verification itself, is a multi-dimensional problemâ€â€Âwhose recipe for success requires a skill in the art of managing and merging multiple views of data from multiple heterogeneous tools. With the emergence of recent standards, such as the IEEE Std-1800 SystemVerilog, many verification teams are starting to integrate advanced coverage-driven verification techniques into their flows. Some teams focus entirely on manually specified functional coverage techniquesâ€â€Âother teams focus on automatically extracted structural coverage techniques, while others blend the multiple techniques to identify holes in their coverage model. This session offers a perspective of today’s coverage problems, including best approaches for blending coverage.
Chip Symposium - DFM
10:45 - 11:35 The Evolving Role of Sign-Off // Proven Strategies for Integrating DFM Technologies [ Show abstract ]
A firestorm has ignited in the semiconductor industry over how IC design tools and methodologies should evolve to address the challenge of achieving yield in nanometer technology. Part of the debate centers on physical verification where there is clearly a need for a rethinking of the process. Without a significant change in the physical verification process, a dramatic increase in total cycle time, driven by Moore's Law, more design rule checks, and longer debug times promises to wreak havoc. The days of relying on ‘DRC clean’ results to ensure yield is also a thing of the past. Today, EDA vendors are hard at work extending the range of tools supporting sign-off to meeting the changing landscape introduced with the nanometer age. In this session you will hear about how DRC steps now incorporate statistical yield modeling, rather than just threshold comparisons. In addition to a fundamental DRC change, Layout database characteristics can now be extracted and represented as statistical distributions. Designers gain insight into the range of results in comparison to both compliance thresholds and recommended rule values. Yield models applied to these results prioritize them by providing the designer with a design quality score. Finally, new visualization tools allow a designer to select the highest priority result and work on it in his preferred layout environment.
2:00 - 2:50 Leveraging a Cross-foundry DFM Approach to Maximize 65nm. Presented by Common Platform Group [ Show abstract ]
Tight collaboration between foundries and EDA/DFM suppliers is critical to increase ‘manufacturing awareness’ earlier in the design cycle. By jointly developing methodologies based on information sharing and tool optimization for specific processes, foundries and EDA companies allow mutual customers to analyze their designs for manufacturability, identify possible yield detractors, and perform the appropriate trade-offs to take the relevant actions. This session presents the types of tools and data that can more effectively address manufacturability early on to achieve first time right silicon, faster production ramp times, and higher yields. Also addressed are tools and approaches to deal with pressing design closure challenges, such as timing, area, power, and signal integrity. It includes an overview of a robust DFM solution consisting of a series of rules- and model-based design kits that allow designers to better predict the impact their decisions will have on manufactured designs implemented in a variety of operating ranges, modes, and conditions. Three of the world’s leading semiconductor companies -- IBM, Chartered Semiconductor Manufacturing and Samsung -- have taken the concept of foundry/DFM supplier cooperation to a new level, with a unique collaboration to jointly develop and support leading-edge manufacturing capabilities in their respective foundries. Find out more about the Common Platform technology approach to design at 90nm, 65nm and 45nm, and how to leverage a comprehensive DFM platform that includes all the necessary information to target the same design at all three fabs.
3:20 - 4:10 Proven Strategies for Integrating DFM Technologies [ Show abstract ]
A key factor in attaining acceptable yield levels is understanding and accounting for the interaction between design and manufacturing. Yield losses in the newer processes include random, systematic and parametric defects and issues with testing. Each of these sources of yield loss needs to analyzed and understood by designers and tool developers. In addition, new techniques and methods must be devised to minimize the impact of these yield loss mechanisms. This session describes the Mentor Graphics tools and methodologies that address critical area analysis, recommended rule analysis, lithographic simulation and the importance of foundry support for these tools.
4:10 - 5:00 Efficient Full-chip Mixed-signal Verification by Leveraging Fast-SPICE Technology [ Show abstract ]
Large mixed-signal system-on-chip designs, blending complex analog and digital blocks, require thorough testing with the right mixed-signal verification tool. The ADVance MS mixed-signal simulator offers comprehensive technologies that support multiple modeling languages: VHDL, Verilog, VHDL-AMS, Verilog-AMS, SystemC, SystemVerilog, and SPICE. A new fast-SPICE simulation technology, ADiT, has been introduced into ADVance MS platform. The ADiT engine is specialized in robust and accurate simulation for analog and mixed-signal circuits; therefore, it is the perfect fast-SPICE engine to complement ADVance MS. With this fast-SPICE technology, mixed-signal SoC with large analog and mixed-signal circuits in transistor level can be validated accurately and efficiently.
PCB Symposium - Design Process
10:45 - 11:35 Don't Let High-speed Design Issues Kill Your Design. Presented by Rob Strange. [ Show abstract ]
Every year we use faster and higher density parts (ICs). But this newer and faster silicon presents engineering challenges in today’s designs. Are engineering and management prepared for these challenges - high speed system design? Does your team have the necessary methodology, engineering skills, and tools for high speed design? This session will explain what is needed to be successful with the newer technologies.
2:00 - 2:50 Managing Industry Trends: Successful PCB Design with Today's High-Speed Architectures [ Show abstract ]
In this presentation, we will examine the current trends in high-speed bus architectures, including parallel busses such as DDR2 as well as SERDES busses such as PCI-Express. The design requirements created by these architectures will be thoroughly examined, in addition to the tools and techniques necessary to overcome design challenges.
3:20 - 4:10 Advanced Routing Technologies [ Show abstract ]
Electronic companies today are competitively driven to produce higher complexity products, at cheaper costs in less time. A significant percent of the design cycle time is spent routing the PCB either manually or with the aid of an aurorouter to produce the densest and highest performing result. This session will discuss new and innovative approaches to the routing process including technologies that are unique and patented by Mentor Graphics. These technologies are giving users up to a 50% improvement in productivity and design cycle time.
4:10 - 5:00 Design for PCB Manufacturing [ Show abstract ]
Including design-for-manufacturing functionality and checking in the design process, rather than waiting for the manufacturer to discover errors, can significantly reduce design cycle times as well as insure the lowest production costs. This session will discuss design process rule setup, design for fabrication checking, communication to manufacturing during the design process, and manufacturing data preparation.
PCB Symposium - System Design Technology
10:45 - 11:35 Don't Let High-speed Design Issues Kill Your Design. Presented by Rob Strange. [ Show abstract ]
Every year we use faster and higher density parts (ICs). But this newer and faster silicon presents engineering challenges in today’s designs. Are engineering and management prepared for these challenges - high speed system design? Does your team have the necessary methodology, engineering skills, and tools for high speed design? This session will explain what is needed to be successful with the newer technologies.
2:00 - 2:50 Optimizing System Design Using FPGA. Presented by Lattice Semiconductor. [ Show abstract ]
System design in terms of performance, productivity, and cost savings can be greatly enhanced through the use of high performance, low cost, and increasingly more capable FPGA architectures, tools, and design techniques. This presentation will deliver details of the complete solutions that FPGAs can provide to meet system design requirements for nearly any application. This session will include SERDES, PCIexpress, DDR, embedded microprocessors, high speed I/O, in-field upgrade, and a host of other system design topics solved featuring Lattice FPGA devices and software and Mentor Graphics design tools.
3:20 - 4:10 Developing ARM Processor-based Embedded Systems in FPGA. Presented by ARM. [ Show abstract ]
ARM will present an overview of how their processor based FPGA systems can be rapidly developed and implemented using Mentor Graphics comprehensive solution offering.
4:10 - 5:00 Breaking new ground in PCB design: Bus planning, informal PCB reuse, WYSIWYG planes and RF design [ Show abstract ]
This session will introduce emerging capabilities and technologies for PCB design: a) Topology planner and router. Providing automated planning tools for the engineer to evaluate and plan bus-system interconnects early in the design phase eliminates the need for paper designs. Topology planing and routing provides a fully automated planning process coupled to auto-routing produces the designs to match the quality of old manual process much more quickly. b) Informal Reuse. Moving or copying a user defined section of layout data on a board provides a highly desirable but informal physical design reuse benefit. c) UPG, the Unified Plane Generator engine. UPG provides designers realtime, live copper fill for their PCB layout, without the requirement to process planes as a post layout task. d) True WYSIWYG plane data and manipulation. e) RF Design, highlighting the novel capabilities allowing capturing and auto-layout of parameterised microstrip with a direct interface into simulation.
Workshops
10:45 - 11:35 Analog/Mixed Signal Simulation with ADVance MS [ Show abstract ]
2:00 - 2:50 Improving Yield with Calibre DFM [ Show abstract ]
2:00 - 2:50 Analog/Mixed Signal Simulation with ADVance MS [ Show abstract ]
3:20 - 4:10 High-speed Tutorial [ Show abstract ]
3:20 - 4:10 Powerful SystemC IDE and Debug with Vista [ Show abstract ]
4:10 - 5:00 Improving Yield with Calibre DFM [ Show abstract ]
4:10 - 5:00 High-speed Tutorial [ Show abstract ]
4:10 - 5:00 Powerful SystemC IDE and Debug with Vista
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